A-Tech System
Company Details
Company Introduction
Developed itmes- Ion beam source- Arc source- Filtered cathodic vacuum arc system and process - LPCVD for nanotube synthesis- Silica PECVD system- UHV(Ultra High Vacuum) sputtering system- Silica TCP (Transformer Coupled Plasma) etcher- UHV-sputter system for ferromagnetic multilayers- Vacuum arc system for nitrides deposition- In-line system of vacuum arc deposition for protecting PDP electrodes- High vacuum test system for a flat light source evaluation- Multifunctional standard sputtering system for R&D- NPPN(New Post Plasma Nitriding) System - Sputter for polygon mirror applicable to laser printer- Production scale of arc ion plating (AIP) system- Ion beam sputter for precision optics- Production scale of AIP and NPPN systems- Ion plating system for various coloration- Pilot scale of arc discharge equipment for CNT transparent electrode sputter web coater for flexible display research- Sputter system for ophthalmic- Polycrystalline silicon ingot growing equipment - PECVD system for anti-reflective coatings on solar cell- PECVD system for graphene deposition- Al plasma nitriding equipment for mass production with KAITECH- Equipment of carbon nanotube using electrical arc discharge method- Graphene PECVD-PVD Cluster equipment
Company Information
Company Product
- Sell Order-made Focused lon Beam SystemSell CNT YARNSell PECVD System for Low Temp. CNTs Synthesis Sell Reactive sputter system for ophthalmic lens coatingsSell Ion Beam Sputter for Precision OpticsSell Evaporation System for Organic EL Device Sell Thermal CVD system for nanowire synthesis Sell Vacuum Furnace for Display Materials PurificationSell ATS-PVD-Series Multisputter With 3x2in Or 3x3in GunsSell Arc Ion Plating System