Oct, 2001 - Foundation as Semiconductor Processing Equipment Manufacturing Feb, 2002 - Company & School Co-Development Project [Completion]May, 2002 - Wafer Dryer Development [Completion]: STG Type IPA Enhanced DryerAug, 2002 - Single Wafer Cleaner Development [Process]Oct, 2002 - Shrink Bath Type Wet-Station Development [Process] Mar, 2003 - Technical Innovation & Venture Company, Certificated from Korea Government '03Apr, 2003 - IPA Enhanced Dryer Penetration [Wafer Process] May, 2003 - Batch Type Wet-Station Penetration [Wafer Process] Oct, 2003 - Single Type Wet-Station Penetration [OELD Process]